Vanadium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic Arc, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets

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Vanadium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron V Sputtering Targets Manufacturer and Vendor

VANADIUM SPUTTERING TARGET

Vanadium is a soft and ductile, silver-grey metal. It has good resistance to corrosion by alkalis, sulfuric and hydrochloric acid. It oxidizes readily at about 933 K (660 C). Vanadium has good structural strength and a low fission neutron cross section, making it useful in nuclear applications. Although a metal, it shares with chromium and manganese the property of having valency oxides with acid properties.

Haohai is specializes in producing high purity Vanadium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, physical vapor deposition (PVD) display and optical applications. Our Vanadium Sputtering Targets for thin film are available monoblock rotary, planar targets or bonded with planar targets with different shapes and dimensions.

Haohai vanadium sputtering targets include vanadium monolithic rotatable sputtering targets, vanadium planar sputtering targets and vanadium cathodic targets.

Vanadium Rotary (Rotatable, Cylindrical) Sputtering Target

Manufacturing Range

OD (mm)	ID (mm)	Length (mm)	Custom Made
50 - 300	30 - 280	100 - 4000	Custom Made

Specification

Composition	V
Purity	2N5 (99.5%), 2N7 (99.7%), 3N (99.9%), 3N5 (99.95%), 4N (99.99%)
Density	6.11 g/cm³
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum Melting, forging, extruding, Machining, Bonding
Shape	Straight, Dog bone
End Types	SCI, SRF, DSF, RFF, WFF, VA, Beakert, GPI Ends Fixation, Spiral Groove, Custom Made
Surface	Ra 1.6 micron

Other Specification

? Vapor degreased and demagnetized after final machining

? ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

? High vacuum tight, leak rate at any location not to exceed 1 x 10^-8 STD CC/SEC.

? Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

Normal Sizes

Vanadium Rotary

Sputtering Target

Normal Sizes

80mm ID x 100mm OD x Long

125mm ID x 153mm OD x 895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1290mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

Compared to titanium planar configurations, Haohai titanium cylindrical sputtering targets offer:

? Larger erosion zones that provide 2 to 2.5 times the material utilization.

? Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

? Custom manufacturing in monolithic, segmented or thermal spray formats.

? End features that are precision machined for individual cathode system designs.

? Reduce the cost of ownership for large area coating operations.

? Variety of materials including.

? Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

? Complete homogeneity and high purity levels produce consistent coverage.

? Able to supply materials to any size operation from R&D to full-scale production.

Vanadium Planar (Rectangle, Circular) Sputtering Target

Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
Rectangle	10 - 2000	10 - 600	1.0 - 25
Circular	Diameter (mm)		Thickness (mm)
Circular	10 - 400		1.0 - 25

Specification

Composition	V
Purity	2N5 (99.5%), 3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density	6.11 g/cm³
Grain Sizes	< 80 micron or on request
Fabrication Processes	Vacuum Melting, Forging, Rolling, Machining
Shape	Plate, Disc, Step, Down bolting, Threading, Custom Made
Type	Monolithic, Multi-segmented Target, Bonding
Surface	Ra 1.6 micron or on request

Other Specifications

? We make sure the same grain direction in the multi-segmented construction parts.

? Flatness, clean surface, polished, free of crack, oil, dot, etc.

Vanadium Arc Cathodes

We supply vanadium rotary and planar arc cathodes as well as vanadium rotary and planar sputtering targets

For our Vanadium Sputtering Target and Arc Cathodes

Tolerance

Acc. to drawings or request.

Impurities Content [ppm]

Vanadium Purity [%]	Elements	2N5 [99.5]	3N5 [99.95]
Metallic Impurities [µg/g]	Al	350	50
	Ca	200	50
	Cr	100	50
	Cu	50	50
	Fe	800	200
	Mo	500	130
	NI	300	50
	Si	800	150
	Sn	100	30
	Ti	250	150
Non-Metallic Impurities [µg/g]	C	150	50
	O	400	200
	H	30	20
	N	200	50
Guaranteed Density [g/cm³]		6.11	6.11
Grain Size [µm]		80	80
Thermal Conductivity [W/(m.K)]		30.7	30.7
Coefficient of thermal expansion [1/K]		8.4^-6	8.4^-6

Analytical Methods:

1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593).

2. Gas elements were analyzed using LECO GAS ANALYZER .

? C,S determined by Combustion-lR

? N,H determined by IGF-TC

? O determined by IGF-NDIR

Application

? Large Area Glass Coating

? Electronics industry

? Wear Resistant Coating

? Decorative Coating

Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our vanadium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.

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