Rie Etching

Description of rie etching:

Equipment Name: Plasma Processing Equipment

rie etching Model:RYC-1000

Machine weight: about 650KG

Rated power: 8KW

Machine power supply: AC-380V/three-phase five-wire

Specifications of rie etching: 1200mm(W)×1300mm(D)×1740mm(H) Industrial Compact

Vacuum chamber specifications: 695mm (W) × 595mm (D) × 550mm (H) imported aluminum

Electrode plate specifications: 450mm (W) × 500mm (D), 11 layers of vertical electrode plates, processing 10 layers

Bracket way: fixed oblique product bracket: 16/layer

Capacity: 160 pieces/time

Processing time: different process, different processing time

Plasma generator power: RF generator + original matcher 0-1000W adjustable

Vacuum Pump System: Mechanical Oil Rotary Vacuum Pump + Roots Pump

Vacuum Measurement System: Pirani Vacuum Gauge

Working vacuum degree: 20-60Pa

Vacuum pump limit pressure: 4.0×10-1Pa

Vacuum time: =100S

Breaking vacuum time: =60S

Vacuum breaking system: dedicated GDQ

Gas supply method: solenoid valve type (3 ways, one way anticorrosion)

Flowmeter adjustment range: 0-500Sccm (ml/min)

Monomer gas circuit: It is connected to the chamber separately and automatically controlled by a grafting device.

Operation method: manually take and place the workpiece, start automatic control with a key

Using of rie etching:

The treatment of various types of medical devices, increase the surface energy, increase the attachment, supporting the special grafting equipment into different monomers, to achieve the surface grafting and other products.

Company of rie etching:

Package of rie etching: