Rf Plasma Treatment

Description of rf plasma treatment

Machine Model: Plasma Processing Equipment

rf plasma treatment Model: PR80L

Equipment weight: about 280KG

Rated power: 3KW

Equipment power supply: AC-380V/three-phase five-wire

rf plasma treatment specification: 920mm(W)×1030mm(D)×1720mm(H)

Vacuum chamber specifications: 450mm (W) × 450mm (D) × 400mm (H) can be customized according to product

Electrode plate specifications: 430mm (W) × 360mm (D), 8 layers, plate spacing: 41mm, can be any combination

Single layer treatment of the largest area: 390mm (W) × 345mm (D)

Bracket mode: custom aluminum bracket structure

Capacity: According to product specifications

Processing time: different process, different processing time

Plasma generator power: RF 13.56MH z, 0-500W adjustable

Vacuum Pump System: Mechanical Vacuum Pump

Vacuum Measurement System: Aifa High Precision Vacuum Gauge

Working vacuum degree: 20-60Pa

Vacuum pump limit pressure: 4.0×10-1Pa

Vacuum time: =60S

Breaking vacuum time: 20-60S

Gas supply method: solenoid valve type

Flowmeter adjustment range: 0-300Sccm (ml/min)

Input air pressure monitoring system: 2 air pressure decompression tables, 2 gas mass flow meters

Operation method: manually take and place the workpiece, start automatic control with a key

Uses: Different combinations for different process manufacturing, can be used to connect devices, metal-based workpieces, ceramics, glass and other workpiece surface cleaning, activation and so on.

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